July 5, 2019 posted by

GLOBALFOUNDRIES 7LP 7nm FinFET process technology platform is ideal for high-performance, power-efficient SoCs in demanding, high-volume applications . GLOBALFOUNDRIES 14LPP 14nm FinFET process technology platform is ideal for high-performance, power-efficient SoCs in demanding, high-volume. Product Briefs. GLOBALFOUNDRIES / Resources / Document Center / 14LPP FinFET Technology Product Brief. 14LPP FinFET Technology Product Brief. Yes.

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Encounter Conformal Equivalence Checker is embedded in multiple stages in the implementation flow. GF’s FinFET offering is an ideal platform for designing high-performance, power-efficient system-on-chips SoCs for the most demanding compute applications. Global demand growth for flat panel display expected to ease through Monitoring for excursions in automotive fabs. GF’s CTT solution requires no additional processing or masking steps and delivers up to twice the density of similar OTP solutions based on dielectric fuse technology.

Tuesday, January 29, at 1: Would Apple change the power GaN world? GlobalFoundries will not pursue that course, at least for now. Samsung, meanwhile, hopes to get EUV lithography in production at the initial stages at 7nm.

GLOBALFOUNDRIES Extends FinFET Offering with New Features to Enable Tomorrow’s Intelligent Systems

GF is owned by Mubadala Investment Company. In addition, as reliability verification needs expand, customer demand drives the development and qualification of new and augmented reliability rules.


Full trace analytics enables the comprehensive examination of process trace data to allow the detection of abnormalities and deviations to the finest details. Offers ultra-high security, one-time programmable OTP and multi-time programmable MTP embedded non-volatile eNVM memory for emerging enterprise, cloud and communication applications. Novel laser technology for microchip-size chemical sensors.

August 30, Sponsored by Mentor Graphics. This allows fab engineers to accurately pinpoint the root causes of yield-impacting issues. This name will be displayed publicly. But instead, GlobalFoundries plans finfte focus our efforts finfer energies on differentiated technology offerings on all of our platforms. By using our websites, you agree to placement of these cookies and globalfouhdries our Privacy Policy.

Foundry Files Blog Portal Login. Comments won’t automatically be posted to your social media accounts unless you select to share. Trending Articles Fundamental Shifts In This will go down as a good year for the semiconductor industry, where new markets and innovation were both necessary and rewarded.

Are we using Moore’s name in vain? Fab Equipment Challenges For Logic is strong, memory is weak, and uncertainty in China could affect demand.


Skip to main content. Leave a Reply Cancel reply Your email address will not be published. They are going in right direction…. At the moment, we have no plans to pursue it.

As with production tape-outs at prior nodes, the starter kit uses the Mentor Graphics Calibre tool suite for sign-off. The 3D FinFET devices offers the perfect answer to growing market needs, with best-in-class intrinsic performance boost over 28nm technology and a superior power footprint compared to any predecessors. Global semiconductor sales increase But at 7nm, the independent ASIC entity will use technology from competitive foundries.


Very wise to sit on sideline to see if EUV ever becomes cost viable with a larger customer base. Foundry-qualified and foundry-maintained reliability rule decks enable design and IP companies alike to establish baseline robustness and reliability criteria finnfet committing extensive time and resources to the creation and support of proprietary verification solutions. Seoul Semiconductor wins patent litigation against Everlight in Germany.

GF Press Releases

Using physically undetectable charge-trapping technology CTT enables security solutions including “physically unclonable device” capabilities and efficient non-volatile memories for higher levels of SoC integration. This webcast will discuss several use cases to showcase how advanced full trace analytics can help not only in provide accurate results, but can also simplify the root cause analysis process and reducing time-to-root-cause, resulting in better yields, lower production costs and increased engineering productivity.

Congrats to GF globalfonudries realistically examining the required technologies, equipment, costs equipment, throughout, yields, etc and the TAM and SAM that could generate revenue. August 27, at 6: